关键词: 菊花, 土壤施硼, 光合色素, 生理生化指标, 适宜施硼量

Abstract: A pot experiment of cultivating chrysanthemum with soil boron applications at 0，0.2，0.5，1.0，2.5，5.0 and 10.0 mg ? kg-1 was conducted to understand the effects of boron on the physiology and biochemistry of chrysanthemum，in which the content of photosynthetic pigments，soluble sugar，vitamin C，proline（Pro），malondialdehyde（MDA）and the activity of catalase（CAT）were measured during the growth of chrysanthemum. The results showed that the suitable soil boron applications improved the flowering and increased the height of chrysanthemum，but the excessive applications delayed the flowering. The rate of 2.5 mg ? kg-1 increased the content of chlorophyll，helped maintain the stable value of chlorophyll a to chlorophyll b and the content of carotenoid in chrysanthemum leaves. Soil boron application rates of 0.2–10.0 mg ? kg-1 increased the content of soluble sugar during the fast growing period，and the application of rates between 0.2 to 5.0 mg ? kg-1 decreased and that of 10.0 mg ? kg-1 increased the content of soluble sugar during the flowering period. The applications of 0.2 and 0.5 mg ? kg-1 increased and 5.0 and 10.0 mg ? kg-1 decreased the CAT activity in chrysanthemum leaves during the fast growing period，but all applications increased the CAT activity during flowering period. The vitamin C content in chrysanthemum leaves increased by boron applications of 0.5 to 2.5 mg ? kg-1，but decreased by applications of 5.0 and 10.0 mg ? kg-1. The content of Pro in chrysanthemum leaves decreased 7.9%–75.5% as the rate of soil boron applications varied. The boron applications of 0.2 to 2.5 mg ? kg-1 had no significant effect on the content of MDA，but the applications of 5.0 and 10.0 mg ? kg-1 increased the content of MDA significantly. In conclusion，the suitable soil boron application rate for the growth of chrysanthemum under this experiment was under 2.5 mg ? kg-1.

Key words: chrysanthemum, Dendranthma morfolium；soil boron application, photosynthetic pigment, physiological-biochemical index, suitable boron application rate